Selective area platinum film deposition

Details Selective area platinum film deposition Selective area platinum film deposition

1993-07-30

1994-06-14

Quach, T. N.

Fishing, trapping, and vermin destroying

437187, 437201, 437245, 427253, H01L 21283

Patent

active

053209788

ABSTRACT:
A process for selectively depositing platinum on a conductive or semiconductive substrate has the steps of: patterning a polyimide layer on the substrate to have exposed areas and unexposed areas; and, at an operating temperature and an operating pressure, flowing a platinum precursor gas over the substrate.

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M. J. Rand, "Chemical Vapor Deposition of Thin-Film Platinum", J. Electrom. Soc'y: Solid State Sci. & Tech. 120 (5) 686-693 (May 1973).
D. S. Y. Hsu et al., "20 nm linewidth platinum pattern fabrication using conformal effusive-source molecular precursor deposition and sidewall lithography", J. Vacuum Sci. & Tech. B 10(5) 2251-2258 (Sep./Oct. 1992).

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