Selective area chemical vapor deposition

Coating processes – Coating by vapor – gas – or smoke – Base includes an inorganic compound containing silicon or...

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Details

4272481, 118715, 118725, C23C 1600

Patent

active

049903748

ABSTRACT:
A fluid dynamic method and apparatus effects the isolation of a predetermined deposition area in a hot-walled chemical vapor deposition chamber and limits the deposition to that area. The disclosed technique reduces stress and cracking in materials produced by chemical vapor deposition, prevents backside growth, and has particular utility in the fabrication by the chemical vapor deposition process of large, lightweight mirrors.

REFERENCES:
patent: 4033286 (1977-07-01), Chern
patent: 4825809 (1989-05-01), Mieno
patent: 4870923 (1989-10-01), Sugimoto

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