Selective and continuous removal of metal-ion contaminants from

Details Selective and continuous removal of metal-ion contaminants from Selective and continuous removal of metal-ion contaminants from

1984-08-20

1987-10-27

Demers, Arthur P.

Liquid purification or separation

Processes

Liquid/liquid solvent or colloidal extraction or diffusing...

204DIG13, 210651, 210654, 210688, 423 24, 423100, 423139, B01D 1504, C02F 142

Patent

active

047028386

ABSTRACT:
A method is disclosed for the selective removal of metal ions from plating solutions comprising contacting the plating solutions with liquid organic complexing agents such as oximes or phosphoric acid esters or microporous material, preferably anisotropic, the microporous material being impregnated with such substances. The microporous material may be in various forms, including beads, fibers, sheets and gels. Copper, zinc and iron contaminants are effectively removed from nickel-plating solutions.

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