Coating apparatus – Gas or vapor deposition – Work support
Patent
1995-06-07
1998-06-09
Bueker, Richard
Coating apparatus
Gas or vapor deposition
Work support
118728, 118500, C23C 1650, C23C 1600
Patent
active
057627150
ABSTRACT:
A mandrel for use in a diamond deposition process for generating free standing diamond films has a segmented surface forming a plurality of surfaces for deposition of diamond. The segmented surface is formed of a plurality of mesa segments on a common supporting base surfaces for the mesas. The mesa segments are preferably removably attached to the common base by any suitable means such as by bolts through the mandrel substrate which extend into the mesa segments. The mesa segments may vary in shape, size, and number, thus permitting different shaped diamond films to be made simultaneously from the same run if desired. The provided arrangement increases yield by reducing losses due to premature lifting of the diamond film during deposition, due to violent lifting after deposition upon cooling of the mandrel, and due to cracking.
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Fryburg George A.
Guarnaccia David G.
Patten, Jr. Donald O.
Bueker Richard
Gordon David P.
Saint-Gobain Norton Industrial Ceramics Corporation
Ulbrich Volker R.
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