Segmented stencil masks with main field and side fields containi

Details Segmented stencil masks with main field and side fields containi Segmented stencil masks with main field and side fields containi

1998-07-08

2000-08-29

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

430296, G03C 500, G03F 900

Patent

active

061106267

ABSTRACT:
Projection-transfer methods, and segmented masks for use with reduction projection-transfer apparatus and methods, are disclosed that permit formation of large-scale device patterns on a mask substrate having limited dimensions. The overall mask pattern is divided into multiple subfields. For each subfield, a determination is made as to whether to divide the subfield into complementary subfields, based on the configuration and dimensions of certain features in the subfields such as islands and peninsular features. All resulting undivided subfields, and one of the complementary subfields of all the divided subfields, are situated in a main field of the mask on a mask substrate. The remaining complementary subfields are situated in side fields flanking the main field.

REFERENCES:
patent: 5624774 (1997-04-01), Okino et al.
patent: 5874198 (1999-02-01), Okino
patent: 5935744 (1999-08-01), Nakajima

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