Single-crystal – oriented-crystal – and epitaxy growth processes; – Processes of growth from liquid or supercritical state – Having pulling during growth
Reexamination Certificate
2005-03-15
2005-03-15
Norton, Nadine G. (Department: 1765)
Single-crystal, oriented-crystal, and epitaxy growth processes;
Processes of growth from liquid or supercritical state
Having pulling during growth
C117S035000, C117S902000, C117S931000, C117S932000
Reexamination Certificate
active
06866713
ABSTRACT:
The present invention provides for a process for preparing a single crystal silicon ingot by the Czochralski method. The process comprises selecting a seed crystal for Czochralski growth wherein the seed crystal comprises vacancy dominated single crystal silicon.
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Banan Mohsen
Sreedharamurthy Hariprasad
MEMC Electronic Materials , Inc.
Norton Nadine G.
Senniger Powers
Song Matthew
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