Seed crystals for pulling a single crystal and methods using the

Single-crystal – oriented-crystal – and epitaxy growth processes; – Processes of growth from liquid or supercritical state – Having pulling during growth

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

117 35, 117902, 117911, C30B 1536

Patent

active

059320028

ABSTRACT:
In a conventional method for pulling a single crystal, in order to exclude the dislocation induced in contact of a seed crystal with a melt, a neck having a small diameter has been formed. But when a heavy single crystal having a large diameter of 12 inches or so is pulled, it is impossible to hold the single crystal, leading to the falling. When the diameter of the neck is made larger in order to prevent the falling, the dislocation cannot be excluded, leading to the propagation of the dislocation to the single crystal. In the present invention, using a seed crystal having a cylindrical body and a conical front portion, the induction of the dislocation is inhibited by making the temperature of the front portion almost the same as the temperature of the melt when the front portion of the seed crystal is brought into contact with the melt and a single crystal is pulled without forming a neck after melting part of the front portion into the melt.

REFERENCES:
patent: 3135585 (1964-06-01), Dash
patent: 3271118 (1966-09-01), Bhola
patent: 5407907 (1995-04-01), Yamada et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Seed crystals for pulling a single crystal and methods using the does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Seed crystals for pulling a single crystal and methods using the, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Seed crystals for pulling a single crystal and methods using the will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-845946

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.