Radiant energy – Photocells; circuits and apparatus – With circuit for evaluating a web – strand – strip – or sheet
Patent
1994-06-13
1995-07-25
Allen, Stephone B.
Radiant energy
Photocells; circuits and apparatus
With circuit for evaluating a web, strand, strip, or sheet
2504922, 25055927, 437 8, G03C 500
Patent
active
054364639
ABSTRACT:
A conformal, substantially uniform thickness layer of photoresist is deposited on a semiconductor wafer by causing photoresist solids to "sediment" out of solution or suspension. Generally, the more conformal the layer, the more uniform the reflectance of the layer and the less variation in underlying feature critical dimension (cd). In order to accommodate possible resulting deviations in photoresist layer thickness causing undesirable reflectance nonuniformities (and cd variations), a top antireflective coating may be applied to the photoresist layer. In the case of a point-by-point lithography process, such as e-beam lithography, the thickness/reflectance variations can be mapped, and exposure doses adjusted accordingly.
REFERENCES:
patent: 4332833 (1982-06-01), Aspnes et al.
patent: 4902631 (1990-02-01), Downey et al.
patent: 4977330 (1990-12-01), Batchelder et al.
patent: 5283141 (1994-02-01), Yoon et al.
patent: 5291239 (1994-03-01), Jackson
patent: 5338630 (1994-08-01), Yoon et al.
patent: 5367157 (1994-11-01), Nilsson et al.
Allen Stephone B.
LSI Logic Corporation
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