Drying and gas or vapor contact with solids – Apparatus – Chamber seals
Patent
1979-12-03
1981-05-26
Schwartz, Larry I.
Drying and gas or vapor contact with solids
Apparatus
Chamber seals
68 5E, 432242, 432244, F26B 2512
Patent
active
042689775
ABSTRACT:
A non-contact seal for thin film treating ovens to prevent leakage of gas both into and out of the oven at the film entry and exit points. An inert buffer gas is introduced into a narrow sealing slit defined between a pair of upper and lower sealing members adjacent the oven opening to buffer the oven gas leakage. An eductor passage also communicates with the sealing slit to carry away gas leakage resulting from thermal diffusion. Apparatus for precisely adjusting the height of the sealing slit to compensate for various film thicknesses and widths are provided. The temperature of the sealing members is regulated by the circulation of a fluid within passageways provided therein, thus to prevent thermal distortions of the slit defining surfaces.
REFERENCES:
patent: 2231716 (1941-02-01), Hansen
patent: 2977106 (1961-03-01), Duff
patent: 2985437 (1961-05-01), Sargeant
patent: 3147982 (1964-09-01), Klein
patent: 3299676 (1967-01-01), Fujihashi
patent: 3650042 (1972-03-01), Boerger et al.
patent: 3667626 (1972-06-01), Torelli et al.
patent: 3868106 (1975-02-01), Donckel et al.
patent: 3919854 (1975-11-01), Denis
patent: 3931684 (1976-01-01), Turnbull et al.
patent: 4027604 (1977-06-01), Jansson
patent: 4064582 (1977-12-01), Sando et al.
patent: 4087992 (1978-05-01), Sando et al.
patent: 4114059 (1978-09-01), Albaric et al.
Exxon Research & Engineering Company
Schwartz Larry I.
Wohlers Donald F.
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