Coating apparatus – Gas or vapor deposition
Patent
1998-10-28
2000-12-19
Lund, Jeffrie R
Coating apparatus
Gas or vapor deposition
118725, C23C 1600
Patent
active
061622982
ABSTRACT:
The invention is relates to CVI/CVD furnace apparatus. More specifically, the invention is directed to a sealed gas inlet for a high temperature CVI/CVD furnace. A method and apparatus are provided for preventing gas leakage around a gas inlet extending through a hole in a susceptor floor in a CVI/CVD furnace. According to the invention, the gas inlet is sealed to the susceptor floor with sufficient intimacy to block leakage of gas through the hole around the gas inlet while allowing the gas inlet to cyclically translate through the hole due to thermal expansion and contraction induced by thermal cycles in the CVI/CVD furnace.
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Leffel Kevin L.
Lund Jeffrie R
Odar Helen A.
The B. F. Goodrich Company
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