Sealant films for materials having high intrinsic vapor pressure

Details Sealant films for materials having high intrinsic vapor pressure Sealant films for materials having high intrinsic vapor pressure

1978-12-07

1980-04-15

Ozaki, G.

Metal treatment

Compositions

Heat treating

148187, 148188, H01L 21228

Patent

active

041982479

ABSTRACT:
A sealant film is employed to migrate species having a high intrinsic vapor pressure through a solid body of semiconductor material by temperature gradient zone melting.

REFERENCES:
patent: 2813048 (1957-11-01), Pfann
patent: 3972741 (1976-08-01), Anthony et al.
patent: 3988766 (1976-10-01), Anthony et al.
patent: 4141757 (1979-02-01), Cline et al.
patent: 4159215 (1979-06-01), Chang et al.
patent: 4159216 (1979-06-01), Anthony et al.

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