Cleaning and liquid contact with solids – Processes – Using solid work treating agents
Reexamination Certificate
2000-06-29
2003-09-16
Gulakowski, Randy (Department: 1746)
Cleaning and liquid contact with solids
Processes
Using solid work treating agents
C134S015000, C134S018000, C134S025100, C134S032000, C134S061000, C134S067000, C015S077000, C451S292000, C451S065000, C451S057000
Reexamination Certificate
active
06620257
ABSTRACT:
REFERENCE TO RELATED APPLICATION
This application claims the priority right under Paris Convention of Japanese Patent Application No. 186386/2000 filed on Jun. 30, 1999, the entire disclosure of which is incorporated herein by reference.
BACKGROUND OF THE INVENTION
i) Field of the Invention
The present invention relates to a scrub cleaning method, a scrub cleaning device for scrub-cleaning the main surface, and a manufacturing method of an information recording medium, for example, of an information recording medium glass substrate, a semiconductor wafer, or another disc-shaped substrate using a sponge, a brush or the like.
ii) Description of Related Art In a disc substrate cleaning device described in Japanese Patent Application Laid-Open No. 206705/1997, a plurality of cleaning stations are arranged, a disc substrate (a circular plate having a central hole) is successively moved through the respective cleaning stations by a transfer device (lifting hook), and the disc substrate is scrub-cleaned by a columnar scrub roller.
In the disc substrate cleaning device, when the disc substrate is transferred to the respective cleaning stations, transfer (conveyance among the cleaning stations) is performed by supporting the central hole of each substrate by the lifting hook, a transfer device needs to be separately disposed, and there is a problem that the device is enlarged in scale. Moreover, when the transfer is performed by supporting the central hole by the lifting hook, there is a problem that the central hole is rubbed and dust is possibly generated.
Furthermore, since much time is required for the transfer to the respective cleaning stations, there is a problem that cleaning time for performing a plurality of cleaning processes is lengthened. Specifically, when the transfer is performed by supporting the central hole of each substrate by the lifting hook, much time is required for a series of operations of substrate stopping, central hole supporting (chucking), transferring, and support (chucking) releasing, and the cleaning time is lengthened. Moreover, when much time is required for the transfer, the substrate dries, and a problem arises that dirt cannot easily be removed.
Particularly, in a one-inch substrate for use in a storage device of a cellular phone, digital camera, car navigation system or the like, since the central hole is small, it is very difficult, with respect to precision and cost, to perform the transfer by supporting the central hole by the lifting hook.
SUMMARY OF THE INVENTION
To solve the aforementioned problems, according to the present invention, the following constitutions are provided.
(Constitution 1) A scrub cleaning device comprising: two planar scrubbers; means for supporting the two planar scrubbers so that scrub surfaces are disposed opposite to each other; means for rotating the planar scrubber around a rotation shaft vertical to the planar scrubber; and a guide member disposed so that a substrate held between the two opposite scrubbers may be conveyed in the rotation direction of the scrubber,
wherein the substrate held between said two opposite scrubbers is conveyed in the scrubber rotation direction by the rotation of the scrubber, and rotated by a friction force generated by abutment on said guide member, so that the substrate is scrubbed/cleaned.
(Constitution 2) A scrub cleaning device comprising, a scrub pad comprising: two annular plate scrubbers, and a wheel for supporting the inner peripheral surface of the annular plate scrubber and the surface opposite a scrub surface so that the scrub surfaces of said two annular plate scrubbers fit each other, and for rotating the scrubber around the center shaft of the annular plate scrubber; and a guide member disposed opposite to the wheel on the inner peripheral surface side of the annular plate scrubber and disposed along the outer periphery of the scrub pad so that a substrate may be conveyed in the rotation direction of said scrub pad, wherein the substrate held between said two opposite scrubbers is conveyed in the rotation direction of the scrubber between the wheel on the inner peripheral surface side of the annular plate scrubber and the guide member by the rotation of the scrub pad, and rotated by a friction force generated by abutment on said guide member, so that the substrate is scrubbed/cleaned.
(Constitution 3) A scrub cleaning device comprising: a substrate cleaning section, provided with means for moving a scrubber while at least a part of a substrate is held between two opposite scrubbers, and conveying the substrate in the movement direction of the scrubber, and friction generation means, disposed along the conveyance direction of the substrate, for abutting on the conveyed substrate to generate a friction, for conveying and scrubbing/cleaning the substrate when the substrate is conveyed and rotated by a friction force generated by abutment of the substrate on the friction generation means; a substrate inlet section for conveying the substrate into said substrate cleaning section; and a substrate outlet section for conveying the substrate from said substrate cleaning section.
(Constitution 4) A scrub cleaning device comprising: a pair of scrubbers which are rotatably supported by and rotate driven by a rotation driving means; a substrate inlet section for conveying a substrate prior to cleaning into a gap between the pair of scrubbers; a substrate cleaning section for cleaning the substrate transferred from the substrate inlet section with a cleaning liquid supplied from a cleaning liquid supply means; a substrate outlet section for discharging the cleaned substrate transferred from the substrate cleaning section; and a conveyance guiding section for conveying the substrate in cooperation with the scrubbers from the substrate inlet section to the substrate cleaning section, and from the substrate cleaning section to the substrate outlet section, wherein the substrate cleaning section further comprises a resistant force supply means for supplying a resistant force to resist against a force in a conveyance direction provided to the substrate by the scrubbers, so that the substrate is scrubbed/cleaned by a differential peripheral speed between the substrate and the scrubbers generated by the resistant force supply means.
(Constitution 5) The scrub cleaning device according to constitution 3 or 4, wherein a sensor for confirming the presence/absence of the substrate is disposed on at least one of the substrate cleaning section, the substrate introducing section and the substrate discharging section.
(Constitution 6) The scrub cleaning device according to any one of constitutions 1 to 5, further comprising stop means for abutting on the substrate conveyed in the rotation direction of the scrubber to temporarily stop the conveyance of the substrate, and forcibly performing the scrub cleaning of the substrate.
(Constitution 7) The scrub cleaning device according to constitution 6, wherein a sensor for confirming the presence/absence of the substrate is disposed at a position where the conveyance of the substrate is temporarily stopped.
(Constitution 8) A scrub cleaning device comprising: a plurality of cleaning stations comprising the constitution according to any one of constitutions 1 to 7; and a conveyance mechanism for conveying a substrate cleaned in the cleaning station to the next cleaning station in said plurality of cleaning stations.
(Constitution 9) The scrub cleaning device according to constitution 8 wherein said conveyance mechanism comprises a guide member for connecting the scrubbers of said plurality of cleaning stations to one another.
(Constitution 10) The scrub cleaning device according to constitution 8 wherein said conveyance mechanism comprises a guide member for connecting the scrubbers of said plurality of cleaning stations to one another, and a scrub roller for holding the substrate along the guide member from opposite sides and conveying the substrate.
(Constitution 11) The scrub cleaning device according to any one of constitutions 1 to 10, further compr
Kanahara Masahumi
Kouno Hiroshi
Cook Alex McFarron Manzo Cummings & Mehler, Ltd.
Gulakowski Randy
Hoya Corporation
Winter Gentle
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