Screen printing apparatus and screen printing method

Printing – Stenciling – Stencil and work support

Reexamination Certificate

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C101S486000, C101SDIG036

Reexamination Certificate

active

07908964

ABSTRACT:
The clearance ‘d’ between a substrate3and a mask2can be reduced at the time of the position recognition by horizontally offsetting two recognition devices53,54for recognizing the substrate3and the mask2. Therefore, since the ascending stroke of the substrate3can be shortened at the time of the position alignment to contact the rear face of the substrate3with the rear face of the mask2, the position misalignment of the substrate in the horizontal direction caused by the raising is suppressed. Accordingly, it is possible to suppress the reduction of the position alignment accuracy with the mask2.

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