Screen apparatus and method

Details Screen apparatus and method Screen apparatus and method

2007-11-30

2009-06-23

Bagnell, David J (Department: 3672)

Boring or penetrating the earth

Processes

C175S314000, C166S236000

Reexamination Certificate

active

07549486

ABSTRACT:
A screen apparatus for use in a well bore. The apparatus comprises a latch; a first tubular disposed within the latch, the first tubular having an internal retrieving profile; a screen extending from the first tubular, and wherein the screen contains a first portion with a first outer diameter, and a second portion that extends to a second outer diameter, and wherein the first outer diameter is larger that than the second outer diameter. The apparatus further comprises a diverter device operatively attached to an inner portion of the first tubular, and wherein the diverter device contains a passage to divert the fluid to an outer portion of the screen. In one preferred embodiment, the screen comprises a series of longitudinal slots of progressively smaller length. Also, the screen may contain a stepped outer diameter portion and inner diameter portion. A method of cleaning debris is also included.

REFERENCES:
patent: 1135809 (1915-04-01), Jones
patent: 3302722 (1967-02-01), Madeley, Sr.
patent: 3450207 (1969-06-01), Hirsch
patent: 3515210 (1970-06-01), Perkins
patent: 4495073 (1985-01-01), Beimgraben
patent: 5377750 (1995-01-01), Arterbury et al.
patent: 5762137 (1998-06-01), Ross et al.
patent: 6155342 (2000-12-01), Oneal et al.
patent: 6296055 (2001-10-01), Taylor
patent: 6571869 (2003-06-01), Pluchek et al.
patent: 6598685 (2003-07-01), Mashburn
patent: 7165633 (2007-01-01), Hall et al.

Affiliated with

Also associated with

Rating

Screen apparatus and method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Screen apparatus and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Screen apparatus and method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4148831