Scratch-resistant mask for photolithographic processing

Details Scratch-resistant mask for photolithographic processing Scratch-resistant mask for photolithographic processing

1976-03-24

1977-09-20

Moses, Richard L.

Photocopying

Miscellaneous

96 36, 355125, G03B 2728

Patent

active

040493474

ABSTRACT:
Disclosed is a photomask and a method for the manufacture thereof. A metal stencil is disposed on a glass substrate such that only preselected areas of the glass which are to be made opaque are exposed. A grit-etch step follows in which depressions are formed in the glass substrate in the preselected areas. Fusible masking material is sprayed in the depressions through the metal stencil. The masking material is preferably in particulate form in a volatile carrier liquid. The carrier liquid is preferably first driven off and, then, the combination is exposed to a relatively high temperature that fuses the masking material to the substrate.

REFERENCES:
patent: 3743417 (1973-07-01), Smatlak
patent: 3873203 (1975-03-01), Stevenson
patent: 3877810 (1975-04-01), Feldstein

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