Scintillator screen method of manufacture

Details Scintillator screen method of manufacture Scintillator screen method of manufacture

1980-10-24

1983-11-15

Hoffman, James R.

Coating processes

Electrical product produced

Fluorescent or phosphorescent base coating

427 70, G01J 158

Patent

active

044156057

ABSTRACT:
A phosphor screen is produced by a vacuum deposition process using a planetary structure for simultaneously rotating and revolving structured substrates within a chamber. A thermal radiation shield is provided at the central axis and, because of the offset positions of the substrates, the deposited phosphor layers are formed with thicker edges than centers to thereby inherently exhibit uniformity correction characteristics. The process allows for single-layer depositions of relatively great thicknesses which, when annealed for relatively short periods of time, are comprised primarily of columnar fibers aligned normally to the substrate to inhibit lateral scattering of generated light within the screen.

REFERENCES:
patent: 3769059 (1973-10-01), Driard et al.
patent: 4011454 (1977-03-01), Lubowski et al.
patent: 4069355 (1978-01-01), Lubowski et al.
A. L. N. Stevels, et al. "Vapour Deposited CsI:Na Layers, I. Morphologic and Crystallographic Properties," Philips Res. Repts 29, 340-352,1974.
A. L. N. Stevels, et al. "Vapour-Deposited CsI:Na Layers, II. Screens for Application in X-Ray Imaging Devices", Philips Res. Repts. 29, 353-362, 1974.
Washida, et al., Toshiba Corp., "High Resolutional Phosphor Screen for X-Ray Image Intensifier" Seventh Symposium on Photo-Electronic Image Devices Sep. 4-8, 1978.

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