Compositions – Fluent dielectric – N-containing
Patent
1982-10-18
1985-01-01
Lieberman, Paul
Compositions
Fluent dielectric
N-containing
25217422, 252523, 252525, 252544, 252355, 252DIG14, 564278, B01F 1716
Patent
active
044915381
ABSTRACT:
A novel group of surface active agents is revealed. These surface active agents are the condensation product of an aldehyde or ketone of from 9 to 20 carbon atoms with a polyoxyalkyleneamine which is an amine terminated block copolymer of oxyethylene and oxypropylene groups.
The Schiff bases of the present invention are characterized by the general formula: ##STR1## In this general formula, R.sub.1 and R.sub.2 can either be hydrogen or an alkyl radical such that the sum of carbon atoms in the radical R.sub.1 --C--R.sub.2 is from 9 to 20.
REFERENCES:
patent: 2765340 (1956-10-01), Haury
patent: 3897362 (1975-07-01), McCoy
Pluronic Polyols in Cosmetics, 1968 by Wyandotte Chemicals Corp., pp. 1 and 4.
Etherified Adducts, Surface Active Ethylene Oxide Adducts, N. Schonfeldt, 1969, Pergamon Press.
Jeffamine Poly(Oxyethylene)Diamines, Texaco Chemical Bulletin, 1981.
Jeffamine M-Series, Texaco Chemical Bulletin, 1981.
Kulason Robert A.
Le Hoa Van
Lieberman Paul
Morgan Richard A.
Park Jack H.
LandOfFree
Schiff base surfactants does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Schiff base surfactants, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Schiff base surfactants will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-576845