Scatterometry monitor in cluster process tool environment...

Details Scatterometry monitor in cluster process tool environment... Scatterometry monitor in cluster process tool environment...

2006-07-11

2006-07-11

Patel, Ramesh (Department: 2121)

Data processing: generic control systems or specific application

Specific application, apparatus or process

Product assembly or manufacturing

C700S095000, C700S096000, C700S108000, C700S109000, C700S110000, C700S120000, C702S033000, C702S035000, C702S040000, C702S155000, C702S168000, C702S182000, C356S611000, C356S394000, C356S625000, C356S636000, C438S795000

Reexamination Certificate

active

07076320

ABSTRACT:
Systems and methods that improve process control in semiconductor manufacturing are disclosed. According to an aspect of the invention, conditions in a cluster tool environment and/or a wafer therein can be monitored in-situ via, for example, a scatterometry system, to determine whether parameters associated with wafer production are within control limits. A cluster tool environment can include, for example, a lithography track, a stepper, a plasma etcher, a cleaning tool, a chemical bath, etc. If an out-of-control condition is detected, either associated with a tool in the cluster tool environment or with the wafer itself, compensatory measures can be taken to correct the out-of-control condition. The invention can further employ feedback/feed-forward loop(s) to facilitate compensatory action in order to improve process control.

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