Scatterometry for samples with non-uniform edges

Details Scatterometry for samples with non-uniform edges Scatterometry for samples with non-uniform edges

2007-06-19

2007-06-19

Toatley, Jr., Gregory J. (Department: 2877)

Optics: measuring and testing

Inspection of flaws or impurities

C702S167000

Reexamination Certificate

active

10795915

ABSTRACT:
A method for simulating the optical properties of samples having non-uniform line edges includes creating a model for the sample being analyzed. To simulate roughness, lines within the model are represented as combinations of three dimensional objects, such as circular or elliptical mesas. The three-dimensional objects are arranged in a partially overlapping linear fashion. The objects, when spaced closely together resemble a line with edge roughness that corresponds to the object size and pitch. A second method allows lines within the model to vary in width over their lengths. The model is evaluated using a suitable three-dimensional technique to simulate the optical properties of the sample being analyzed.

REFERENCES:
patent: 5607800 (1997-03-01), Ziger
patent: 5739909 (1998-04-01), Blayo et al.
patent: 5867276 (1999-02-01), McNeil et al.
patent: 5889593 (1999-03-01), Bareket
patent: 5910842 (1999-06-01), Piwonka-Corle et al.
patent: 5963329 (1999-10-01), Conrad et al.
patent: 6268916 (2001-07-01), Lee et al.
patent: 6429943 (2002-08-01), Opsal et al.
patent: 6483580 (2002-11-01), Xu et al.
patent: 6867866 (2005-03-01), Chang et al.
patent: 2001/0051856 (2001-12-01), Niu et al.
patent: 2002/0038196 (2002-03-01), Johnson et al.
patent: 2002/0158193 (2002-10-01), Sezginer et al.
patent: 2003/0147086 (2003-08-01), Rosencwaig et al.
patent: 2004/0070772 (2004-04-01), Shchegrov et al.
patent: 2005/0280810 (2005-12-01), Johnson
patent: WO 03/009063 (2003-01-01), None
patent: WO 03/075041 (2003-09-01), None
Bischoff et al., “Characterization of 3D resist patterns by means of optical scatterometry”, May 1999, SPIE, vol. 3743, pp. 49-60.
Yeung et al., “Electromagnetic Scatterometry Applied to In Situ Metrology”, 2001, SPIE, vol. 4344, pp. 484-495.
J. Opsal et al., “Contact hole inspection by real-time optical CD metrology”, Metrology, Inspection, and Process Control for Microlithography XVII, Daniel J. Herr, Editor, Proceedings of SPIE vol. 5038 (2003), pp. 597-603.
J. Bischoff et al., “Optical Digital Profilometry applications on contact holes”, Metrology, Inspection, and Process Control for Microlithography XVII, Daniel J. Herr, Editor, Proceedings of SPIE vol. 5038 (2003), pp. 1080-1088.
B.D. Bunday et al., “CD-SEM Measurement of Line Edge Roughness Test Patterns for 193 nm Lithography”, Metrology, Inspection, and Process Control for Microlithography XVII, Daniel J. Herr, Editor, Proceedings of SPIE vol. 5038 (2003), pp. 674-688.

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