Scatterometry alignment for imprint lithography

Details Scatterometry alignment for imprint lithography Scatterometry alignment for imprint lithography

2007-10-16

2007-10-16

Gupta, Yogendra N. (Department: 1722)

Plastic article or earthenware shaping or treating: apparatus

Preform reshaping or resizing means: or vulcanizing means...

Surface deformation means only

C264S040100, C356S401000, C425S150000, C425S171000, C425S174400

Reexamination Certificate

active

11347198

ABSTRACT:
Described are methods for patterning a substrate by imprint lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate. A template is brought into contact with the liquid and the liquid is cured. The cured liquid includes an imprint of any patterns formed in the template. Alignment of the template with a previously formed layer on a substrate, in one embodiment, is accomplished by using scatterometry.

REFERENCES:
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patent: 5772905 (1998-06-01), Chou
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patent: 6696220 (2004-02-01), Bailey et al.
patent: 6842229 (2005-01-01), Sreenivasan et al.
patent: 7070405 (2006-07-01), Sreenivasan et al.

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