Scattering reticle for electron beam systems

Details Scattering reticle for electron beam systems Scattering reticle for electron beam systems

1995-11-22

1997-10-07

Walberg, Teresa J.

Electric heating

Metal heating

By arc

430 5, G03F 900

Patent

active

056744137

ABSTRACT:
A reticle for an electron beam system for direct writing applications has a base layer that contains a reticle pattern; a set of reinforcing struts connected to the base layer separating the base layer into a set of non-contiguous subfields; in which the pattern is carried by a set of apertures in said base layer; and in which the base thickness is set such that the probability that an electron traversing said base thickness will suffer a collision that removes it from the beam is greater than 90% while the probability that the electron will be absorbed is low; and in which, optionally, selected subfields of the reticle are compensated for errors in the remainder of the system.

REFERENCES:
patent: 4140913 (1979-02-01), Anger et al.
patent: 4243866 (1981-01-01), Pfeiffer et al.
patent: 4376249 (1983-03-01), Pfeiffer et al.
patent: 4544846 (1985-10-01), Langner et al.
patent: 4577111 (1986-03-01), Saitou et al.
patent: 4621371 (1986-11-01), Gotou et al.
patent: 4780382 (1988-10-01), Stengl et al.
patent: 4855197 (1989-08-01), Zapka et al.
patent: 5036209 (1991-07-01), Kataoka et al.
patent: 5105089 (1992-04-01), Yamada
patent: 5260151 (1993-11-01), Berger et al.
patent: 5308991 (1994-05-01), Kaplan
patent: 5364718 (1994-11-01), Oae et al.
Bohlen et al., "High Throughout Submicron Lithography with Electron Beam Proximity Printing", Solid State Technology, Sep. 1984, pp. 210-217.
Berger et al., "New approach to projection-electron lithography with demonstrated 0.1 .mu.m linewidth", Appl. Phys. Lett. 57(2), 9 Jul. 1990, pp. 153-155.
Liddle et al., "Mask fabrication for projection electron-beam lithography incorporating the SCALPEL technique", J. Vac. Sci. Technol.B, 9 (6), Nov./Dec. 1991, pp. 3000-3004.
Berger et al., "Projection electron-beam lithography: A new approach", J. Vac. Sci. Technol.B, vol. 9, No. 6, Nov./Dec. 1991, pp. 2996-2999.

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