Scattering apodizer for laser beams

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35016212, G02B 300, G02B 2746

Patent

active

045374759

ABSTRACT:
A method is disclosed for apodizing a laser beam to smooth out the production of diffraction peaks due to optical discontinuities in the path of the laser beam, such method comprising introduction of a pattern of scattering elements for reducing the peak intensity in the region of such optical discontinuities, such pattern having smoothly tapering boundaries in which the distribution density of the scattering elements is tapered gradually to produce small gradients in the distribution density, such pattern of scattering elements being effective to reduce and smooth out the diffraction effects which would otherwise be produced. The apodizer pattern may be produced by selectively blasting a surface of a transparent member with fine abrasive particles to produce a multitude of minute pits. In one embodiment, a scattering apodizer pattern is employed to overcome diffraction patterns in a multiple element crystal array for harmonic conversion of a laser beam. The interstices and the supporting grid between the crystal elements are obscured by the gradually tapered apodizer pattern of scattering elements.

REFERENCES:
patent: 3867017 (1975-02-01), Bliss et al.
patent: 4013338 (1977-03-01), Sato et al.
patent: 4030817 (1977-06-01), Westell
patent: 4339177 (1982-07-01), March
patent: 4469407 (1984-09-01), Cowan et al.
Costich et al; "Apertures to Shape Highpower Beams"; Laser Focus; Sep. 1974; pp. 43-46.
Simmons et al; "Optical Beam Shaping Device Using Polarization Effects"; Applied Optics; vol. 13, No. 7; Jul. 1974; pp. 1629-1632.
Wolf; Progress in Optics; vol. III; 1964; pp. 31-39; North-Holland Publ. Co.; Amsterdam.

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