Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2005-03-01
2005-03-01
Letscher, Geraldine (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C430S311000, C430S312000, C430S322000
Reexamination Certificate
active
06861183
ABSTRACT:
A mask used for imaging nearly dense features in a substrate. Scatter dots are disposed on the mask in proximity to the nearly dense features, where the scatter dots adjust photon levels of the nearly dense features to a desired level. The adjustment is controlled by selective adjustment of a duty cycle and degree of stagger of the scatter dots. In this manner, the scatter dots adjust the optical properties of the nearly dense features to be very similar to the optical properties of dense features, which enables more accurate imaging of the nearly dense features on the substrate. However, because the scatter dots are discontinuous, they do not overcorrect in the same manner that a scatter bar formed at a minimum resolution might overcorrect. Further, there is a reduced likelihood that the scatter dots would actually print on the substrate.
REFERENCES:
patent: 4895780 (1990-01-01), Nissan-Cohen et al.
patent: 6733929 (2004-05-01), Pierrat
Finders et al.,KrF lithography for 130 nm, SPIE vol. 4000, p. 192-205, Optical Microlithography XIII, Jul. 2000.
Letscher Geraldine
LSI Logic Corporation
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