Scanning type exposure apparatus and device manufacturing method

Details Scanning type exposure apparatus and device manufacturing method Scanning type exposure apparatus and device manufacturing method

1996-12-12

1999-02-16

Gray, David M.

Photocopying

Projection printing and copying cameras

Distortion introducing or rectifying

355 71, G03B 2768

Patent

active

058726179

ABSTRACT:
A scanning type exposure apparatus includes an illumination device for illuminating a mask, a projection device for projecting a pattern of the mask onto a substrate and a scanning device for scanning, in a scanning direction, the mask and the substrate relative to the illumination device and the projection device, respectively. The projection device includes a stop device for setting an effective numerical aperture in the scanning direction to be larger than an effective numerical aperture in a direction perpendicular to the scanning direction. Also disclosed are various photomasks, as well as a scanning type exposure apparatus which scans and exposes a substrate by using such photomasks and a device manufacturing method that includes a step of transferring a device pattern onto a substrate by using such photomasks.

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Y. Unno, "Polarization Effect of Illumination Light", SPIE, vol. 1927, Optical/Laser Microlithography VI (1993), pp. 879-891.
M. Noguchi, et al., "Subhalf Micron Lithography System With Phase-Shifting Effect", SPIE, vol. 1674, Optical/Laser Microlithography V (1992), pp. 92-104.

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