Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Patent
1993-10-14
1995-06-13
Dzierzynski, Paul M.
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
250398, 25049224, H01J 37317
Patent
active
054245494
ABSTRACT:
An electron-beam lithography apparatus and method, including an electron source with a mask or photocathode for generating a patterned electron beam; an electron-sensitive resist layer; a conductive plate with a slit, located between the electron source and the resist layer, with the patterned electron beam passing only through the slit; an electric field between the electron source and the conductive plate to accelerate electrons, with the conductive plate causing the electric field between the plate and the resist to be substantially zero; a magnetic field between the electron source and the resist, to focus electrons on the resist; and alignment device for synchronously scanning the mask or photocathode and the resist at the same velocity relative to the slit and to the electron source, and at zero velocity relative to each other, so that substantially all of the pattern of the patterned electron beam is imaged on the resist without substantial change in size.
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Board of Supervisors of Louisiana State University and Agricultu
Dzierzynski Paul M.
Nguyen Kiet T.
Runnels John H.
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