Scanning systems and methods for providing ions from an ion...

Details Scanning systems and methods for providing ions from an ion... Scanning systems and methods for providing ions from an ion...

2006-01-31

2006-01-31

Berman, Jack I. (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S442110

Reexamination Certificate

active

06992310

ABSTRACT:
Ion implantation scanning systems and methods are presented for providing ions from an ion beam to a treatment surface of a workpiece, wherein a beam is electrically or magnetically scanned in a single direction or plane and an implanted workpiece is rotated about an axis that is at a non-zero angle relative to the beam scan plane, where the workpiece rotation and the beam scanning are synchronized to provide the beam to the workpiece treatment surface at a generally constant angle of incidence.

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“NV-6208: A Midcurrent Ion Implanter With Constant Beam Angle or Incidence”, Jimmy L. Fleming, Jerald P. Dykstra, Monty L. King, Andy M. Ray and Robert B. Simonton, Nuclear Instruments and Methods in Physics Research B 37/38 (1989), North Holland, Amsterdam, pp. 601-604.

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