Scanning system for inspecting anomalies on surfaces

Details Scanning system for inspecting anomalies on surfaces Scanning system for inspecting anomalies on surfaces

1995-07-10

1999-03-16

Hantis, K P

Optics: measuring and testing

Inspection of flaws or impurities

Surface condition

G01N 2100

Patent

active

058837108

ABSTRACT:
A high sensitivity and high throughput surface inspection system directs a focused beam of light at a grazing angle towards the surface to be inspected. Relative motion is caused between the beam and the surface so that the beam scans a scan path covering substantially the entire surface and light scattered along the path is collected for detecting anamolies. The scan path comprises a plurality of arrays of straight scan path segments. The focused beam of light illuminates an area of the surface between 5-15 microns in width and this system is capable of inspecting in excess of about 40 wafers per hour for 150 millimeter diameter wafers (6-inch wafers), in excess of about 20 wafers per hour for 200 millimeter diameter wafers (8-inch wafers) and in excess of about 10 wafers per hour for 300 millimeter diameter wafers (12-inch wafers).

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