Scanning system for a particle beam scanning apparatus

Details Scanning system for a particle beam scanning apparatus Scanning system for a particle beam scanning apparatus

1985-09-20

1987-08-04

Anderson, Bruce C.

Radiant energy

With charged particle beam deflection or focussing

Magnetic lens

250396ML, H01J 326

Patent

active

046848088

ABSTRACT:
A scanning lens system for a particle beam scanning device having deflection elements and optical lenses for corpuscular radiation characterized by the deflecting elements being deflecting dipole elements which are disposed in the particle beam directly preceding at least one imaging lens so that the deflection chromatic aberration for arbitrary deflection angles should disappear and the lens field of a magnetic projection lens should be free of magnetic deflection elements. As a result of the arrangement, the isotropic deflection chromatic aberrations of the dynamically deflecting dipole elements compensates the isotropic off-axis chromatic aberrations of at least one imaging lens and at least one imaging lens forms an image rotation-free system.

REFERENCES:
patent: 4335309 (1982-06-01), Anger et al.
patent: 4362945 (1982-12-01), Riecke
patent: 4475044 (1984-10-01), Kuroda et al.
Hans Pfeiffer, "Recent Advances in Electron-Beam Lithography for the High-Volume Production of VLSI Devices", IEEE Transactions on Electron Devices, vol. ED-26, No. 4, Apr., 1979, pp. 663-673.

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