Scanning-slit exposure device

Details Scanning-slit exposure device Scanning-slit exposure device

1997-03-27

1999-03-30

Mathews, Alan A.

Photocopying

Projection printing and copying cameras

Illumination systems or details

355 53, 359566, G03B 2754

Patent

active

058895809

ABSTRACT:
A scanning-slit exposure device is provided with a radiation source (1) emitting radiation pulses through an exit window (2). An imaging system (3) images the exit window onto a surface (4) to be exposed by the radiation. The surface is scanned relative to the exit window image in a scan direction. To avoid the banding-type non-uniformities in the exposure, the device comprises a scattering element (12) which scattering element causes a blur of the exit window image only in the scan direction. The scattering element is arranged in the entrance pupil of the imaging system (3).

REFERENCES:
patent: 5289231 (1994-02-01), Magome et al.
patent: 5291240 (1994-03-01), Jain
patent: 5329333 (1994-07-01), Noguchi et al.
patent: 5659383 (1997-08-01), Ozawa
patent: 5703675 (1997-12-01), Hirukawa et al.
patent: 5724122 (1998-03-01), Oskotsky
The Phase Fresnel Lens. Kenro Miyamoto. (Jan., 1961). Journal of the Optical Society, vol. (51), No. 1, pp. 17-20.

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