Scanning projection exposure method and projection exposure appa

Details Scanning projection exposure method and projection exposure appa Scanning projection exposure method and projection exposure appa

1996-09-25

1997-11-11

Font, Frank G.

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

356363, 355 53, 250548, G01B 1100, G01B 902

Patent

active

056869975

ABSTRACT:
After a mask (12) and a substrate (16) have been scanned as one unit relative to exposure light (32) to expose a predetermined area on the substrate (16), the mask (12) is stepped in a direction parallel but opposite to the scanning direction. Thereafter, the mask (12) and the substrate (16) are scanned as one unit again to expose another area on the substrate (16). Thus, throughput is improved when a large-sized substrate is divisionally exposed.

REFERENCES:
patent: 5602620 (1997-02-01), Miyazaki et al.

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