Scanning probe-based lithography method

Details Scanning probe-based lithography method Scanning probe-based lithography method

2004-10-29

2009-02-17

Fletcher, III, William Phillip (Department: 1792)

Coating processes

Nonuniform coating

Deforming the base or coating or removing a portion of the...

C427S557000, C427S355000, C427S271000, C977S849000, C977S850000, C977S851000, C977S855000, C977S857000

Reexamination Certificate

active

07491425

ABSTRACT:
A resist medium in which features are lithographically produced by scanning a surface of the medium with an AFM probe positioned in contact therewith. The resist medium comprises a substrate; and a polymer resist layer within which features are produced by mechanical action of the probe. The polymer contains thermally reversible crosslinkages. Also disclosed is a method that generally includes scanning a surface of the polymer resist layer with an AFM probe positioned in contact with the resist layer, wherein heating the probe and a squashing-type mechanical action of the probe produces features in the layer by thermally reversing the crosslinkages.

REFERENCES:
patent: 2002/0127491 (2002-09-01), Weiss et al.
patent: 2003/0218960 (2003-11-01), Albrecht et al.
patent: 2005/0047307 (2005-03-01), Frommer et al.

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