Scanning probe based lithographic alignment

Details Scanning probe based lithographic alignment Scanning probe based lithographic alignment

2005-10-18

2005-10-18

Olsen, Allan (Department: 1763)

Etching a substrate: processes

Forming pattern using lift off technique

C216S044000, C216S052000

Reexamination Certificate

active

06955767

ABSTRACT:
The lithographic process described herein involves aligning a patterned mold with respect to an alignment mark that is disposed on a substrate based upon interaction of a scanning probe with the alignment mark. By this method, the patterned mold may be aligned to an atomic accuracy (e.g., on the order of 10 nm or less), enabling nanometer-scale devices to be fabricated. A device formed by this lithographic method and a system for implementing this lithographic method with alignment also are described.

REFERENCES:
patent: 5038322 (1991-08-01), Van Loenen
patent: 5317141 (1994-05-01), Thomas
patent: 5535185 (1996-07-01), Kishi et al.
patent: 5772905 (1998-06-01), Chou
patent: 5801472 (1998-09-01), Wada et al.
patent: 5866806 (1999-02-01), Samsavar et al.
patent: 6136208 (2000-10-01), Chou et al.
patent: 6165911 (2000-12-01), Calveley
patent: 04342112 (1992-11-01), None
patent: WO02/17383 (2002-02-01), None
D L White and O R Wood—“Novel Alignment System for Inprint Lithography”—J Vac Sci Technol B 18(6) Nov./Dec. 2000—pp. 3552-3556.
Stephen Y. Chou et al., “Imprint Lithography with 25-Nanometer Resolution,” Science, vol. 272 (Apr. 5, 1996).

Affiliated with

Also associated with

Rating

Scanning probe based lithographic alignment does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Scanning probe based lithographic alignment, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Scanning probe based lithographic alignment will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3480016