Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With means for photochemical energization of a gas using...
Reexamination Certificate
2007-09-18
2007-09-18
Hassanzadeh, Parviz (Department: 1763)
Adhesive bonding and miscellaneous chemical manufacture
Differential fluid etching apparatus
With means for photochemical energization of a gas using...
C118S050100, C118S722000
Reexamination Certificate
active
09736073
ABSTRACT:
A scanning plasma reactor for exciting reactant gases at a substrate surface including a beam forming module, a gas injection module, a reaction chamber with a window and a vacuum chuck, a gas exhaust module. Radiation from the beam forming module and the reactant gas create an excited plasma zone. The excited plasma zone is translated across the substrate like a windshield wiper blade, or the substrate is conveyed under a fixed gas reaction zone.
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Elliott et al., “Deep UV-Photoreactive Cleaning with Catadioptric Projection Optics and Reactive Gases”, Future Fab International, pp. 273-276, 279-282, date unknown.
Elliott David J.
Harte Kenneth J.
Shephard Larry E.
Crowell Michelle
Hassanzadeh Parviz
Iandiorio & Teska
UVTech Systems Inc.
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