Scanning lithography system with opposing motion

Photocopying – Projection printing and copying cameras – Step and repeat

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

355 52, 355 60, 355 65, 355 71, G03B 2742, G03B 2768, G03B 2770

Patent

active

058152458

ABSTRACT:
A small field scanning photolithography system uses opposing motion of a reticle and a blank to compensate for image reversal by a projection system such as a conventional Wynne-Dyson optical system which forms a reverted image on a blank. The reticle has a reverted pattern. During scanning, the reticle moves along a reverted axis in a direction opposite the direction in which the blank moves. The opposing motions can either expose a stripe on the blank or index the reticle and blank for exposure of a next stripe. In one embodiment of the invention, the reticle and blank are on independently movable precision air bearing stages. Typically, the blank and reticle move together perpendicular the reverted axis and in opposite direction along the reverted axis. The stages can move the reticle and blank different amounts to correct for shrinkage and temperature changes which cause the size of the reticle and blank to differ.

REFERENCES:
patent: 3819265 (1974-06-01), Feldman et al.
patent: 4171870 (1979-10-01), Bruning et al.
patent: 4458302 (1984-07-01), Shiba et al.
patent: 4585337 (1986-04-01), Phillips
patent: 4748477 (1988-05-01), Isohata et al.
patent: 4749867 (1988-06-01), Matsushita et al.
patent: 4924257 (1990-05-01), Jain
patent: 5168306 (1992-12-01), Morimoto et al.
patent: 5285236 (1994-02-01), Jain
patent: 5289231 (1994-02-01), Magome et al.
patent: 5298939 (1994-03-01), Swanson et al.
patent: 5401934 (1995-03-01), Ainsworth, Jr. et al.
patent: 5506684 (1996-04-01), Ota et al.
patent: 5528027 (1996-06-01), Mizutani
patent: 5557469 (1996-09-01), Markle et al.
patent: 5559529 (1996-09-01), Sheets et al.
Muller et al., "Large Area Fine Line Patterning by Scanning Projection Lithography," MCM '94 Proceedings, 1994, pp. 100-104.
Greed, Jr., et al., "Variable Magnification in a 1:1 Projection Lithography System," SPIE vol. 334 Optical Microlithography Technology for Mid-1980s 1982, pp. 2-9.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Scanning lithography system with opposing motion does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Scanning lithography system with opposing motion, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Scanning lithography system with opposing motion will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-690898

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.