Scanning light exposure apparatus

Details Scanning light exposure apparatus Scanning light exposure apparatus

1994-12-06

1996-11-26

Phan, James

Optical: systems and elements

Deflection using a moving element

Using a periodically moving element

359201, 250548, 356401, 355 46, G02B 2608

Patent

active

055791476

ABSTRACT:
A scanning light exposure apparatus comprises illumination optical systems for radiating light beams to a plurality of sub-areas in a pattern area of a mask, a plurality of projection optical systems arranged along a predetermined direction for projecting erected images of unity magnification of the sub-areas by the light beams transmitted through the mask onto a photo-sensitive substrate, a diaphragm member arranged at a substantially conjugate position to the photo-sensitive substrate in each illumination optical system for limiting a projection area of the sub-area to the photo-sensitive substrate, scanning means for synchronously scanning said mask and said photo-sensitive substrate substantially transversely to the predetermined direction relative to said projection optical systems and diaphragm control means for changing a width of an aperture of each diaphragm member along a direction transverse to the predetermined direction.

REFERENCES:
patent: 4316665 (1982-02-01), Mochizuki et al.
patent: 4350431 (1982-09-01), Mechizuki et al.
patent: 5172189 (1992-12-01), Mitome
patent: 5359389 (1994-10-01), Isohata

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