Scanning laser lithography system alignment apparatus

Details Scanning laser lithography system alignment apparatus Scanning laser lithography system alignment apparatus

1992-11-09

1994-07-05

Reinhart, Mark J.

Recorders

Printing, dotting, or punching marker

Ink transfer support or moving means

B41J 2435

Patent

active

053273389

ABSTRACT:
A direct-write lithography tool having improved alignment characteristics. The present invention discloses use of an optical alignment apparatus in a multi-beam lithography system. The optical alignment apparatus provides for alignment through a reduction lens utilized by the multi-beam lithography system for writing to semiconductor wafers and the like through use of optics for correction of distortion and curvature caused by viewing with a radiant energy beam of a different wavelength than the beams used for writing. Further, the alignment optics provide for multiple paths in a single optics system through use of liquid crystal retarders and beam splitters to direct the radiant energy beam through a selected optical path. In the present invention, a first optical path may provide for high magnification and a second for low magnification. Further, other optical paths may provide for bright or dark field illumination and viewing.

REFERENCES:
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patent: 4962318 (1990-10-01), Nishi
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patent: 5055696 (1991-10-01), Hariachi
Silicon Processing for the VLSI Era, vol. 1, Process Technology, Stanley Wolf and Richard N. Tauber, Lattice Press, 1987, pp. 493-505.

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