Electricity: measuring and testing – Fault detecting in electric circuits and of electric components – Of individual circuit component or element
Reexamination Certificate
2006-08-01
2006-08-01
Hollington, Jermele (Department: 2829)
Electricity: measuring and testing
Fault detecting in electric circuits and of electric components
Of individual circuit component or element
Reexamination Certificate
active
07084661
ABSTRACT:
A scanning Kelvin microprobe (SKM) system capable of measuring and analyzing surface characteristics of samples is provided. Also provided is a process of measuring and analyzing surface characteristics of samples. Further, there are provided uses of the SKM system in measuring and analyzing surface characteristics of conductors, semiconductors, insulators, chemicals, biochemicals, photochemicals, chemical sensors, biosensors, biochemical microarrays, microelectronic devices, electronic imaged devices, micromachined devices, nano-devices, corroded materials, stressed materials, coatings, adsorbed materials, contaminated materials, oxides, thin films, and self assembling monolayers.
REFERENCES:
patent: 4433288 (1984-02-01), Moore
patent: 4649336 (1987-03-01), Bindner et al.
patent: 5267471 (1993-12-01), Abraham et al.
patent: 5336887 (1994-08-01), Yagi et al.
patent: 5369370 (1994-11-01), Stratmann et al.
patent: 5442297 (1995-08-01), Verkuil
patent: 6005246 (1999-12-01), Kitamura et al.
patent: 6006594 (1999-12-01), Karrai et al.
patent: 6073485 (2000-06-01), Kitamura
patent: 6094971 (2000-08-01), Edwards et al.
patent: 6097197 (2000-08-01), Matsuyama et al.
W. Nabhan, B. Eqer et al. , A. Broniatowski and G. De Rosny, “A high-resolution scanning Kelvin probe. . . measurements on the 100 n. scale”,Rev. Sci. Instrum., 1997, 68 (8), 3108.
M. Schmidt, M. Nohlen, G.,Bermes, M. Bomer and K. Wandelt, “A versatile Kelvin probe for dynamic work function change measurements during gas adsorption andin situfilm growth experiments”,Rev. Sci. Instrum., 68, Oct. 1997, 3866.
M. Bömisch et al. “Atomic Force Microscope Based Kelvin Probe Measurements: Application To An Electrochemical Reaction”,J. Phys. Chem B, 1997, 101, 10162-10165.
W.A. Zisman, “A New Method of Measuring Contact Potential Differences in Metals”,Rev. Sci. Instrum., 1932,3, 367-370.
P. Craig and V. Radeka,Rev. Sci. Instrum., “Stress Dependence of Contact Potential: The ac Kelvin Method”, 1970, 41, 2, 258.
N.A. Surplice and R.J. D'Arcy, “A critique of the Kelvin method of measuring work functions”,J. Phys.E: Sci. Instrum., 3, (1970), 477.
B. Ritty, et al., “Conditions necessary to get meaningful measurements from the Kelvin method”,J. Phys. E: Sci.Instrum., 15, 1982, 310.
I.D. Baikie, E. Venderbosch, “Analysis of stray capacitance in the Kelvin method”, Rev.Sci.Instrum. 62 (3), 1991, 725.
O.A. Semenikhin et al., “Atomic Force Microscopy and Kelvin Probe Force Microscopy Evidence of Local Structural Inhomogeneity and Nonuniform Dopant Distribution in Conducting Polybithiophene”,J. Phys. Chem.100, 48, 1996, 18603.
I. Samec. W. Johnson, et al. “Kelvin probe measurements for chemical analysis: interfacial structure of electrodes exposed to the gas phase containing water vapour”,Sensors and Actuators, B, 13-14 (1993) 741-742.
S. Lundgren et al., “A high-temperature Kelvin probe for flow reactor studies”,Rev. Sci. Instrum.66, 7, (1995) 3976.
C. S. Kumar, et al., “Automated reed-type Kelvin probe for work function and surface photovoltage studies”, Rev. Sci. Instrum. 67 (3) (1996), 805.
H.A. Engelhardt, et al. “An accurate and versatile vibrating capacitor for surface and adsorption studies”,J. Phys E: Sci. Instr.19, (1977), 1133.
I.D. Baikie, et al. “Characterization of Oxides and Thin Films”,Mat. Res. Soc. Symp. Proc.309, (1993), 35.
M. E. McGovern et al. “Thiol functionalization of surfaces for biosensor development”, M. Thompson,Can.J.Chem. 77 (1999), 1678.
L.M. Furtado et al. “Interactions of HIV-1 TAR RNA with Tat-Derived Peptides Discriminated by On-Line Acoustic Wave Detector”,Anal. Chem.71, (1999), 1167.
M. E. McGovern et al. “Pentafluorinated Probes for the X-ray Photoelectron Spectroscopic Study of Immobilized Bifunctional Silanes”,Anal. Chem.2000, 72, pp. 128-134.
M. Nonnenmacher, et al. “Kelvin probe force microscopy”,Appl. Phys, Lett., 1991, 58, (25), 2921.
M. Nonnenmacher, et al. “Surface investigations with a Kelvin probe force microscope”,Ultramicroscopy, 1992, 42-44, 268.
M. Yasutake, “Improvement of Kelvin Probe Force Microscope (KFM) System”,J. Appl. Phys., 1995, 34, 3403.
M. Yasutake, et al. “Surface potential measurements using the Kelvin probe force microscope”,Thin Solid Films, 1996, 279.
Cavic, et al. “Label-free detection of DNA probe microarrays by scanning Kelvin microprobe”, Internet: CS2000 Conference Program, Abstract 56, Session AN3, Online, May 13, 2000, XP-002182470.
L-E. Cheran, H-D. Liess, M. Thompson, “Scanning Kelvin Microprobe in the Tandem Analysis of Surface Topography and Chemistry”,The Analyst, 1999, 124, 961.
Cheran, et al., “Surface immobilized biochemical macromolecules studied by scanning Kelvin microprobe”,The Royal Society of Chemistry, 2000,116, 23-34.
Cheran Larisa-Emilia
Thompson Michael
Bored Ladner Gervais LLP
Hollington Jermele
Marsman Kathleen E.
Sensorchem International Corporation
LandOfFree
Scanning kelvin microprobe system and process for analyzing... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Scanning kelvin microprobe system and process for analyzing..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Scanning kelvin microprobe system and process for analyzing... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3650877