Scanning exposure technique

Details Scanning exposure technique Scanning exposure technique

2006-08-01

2006-08-01

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S055000

Reexamination Certificate

active

07084957

ABSTRACT:
An exposure apparatus for exposing a substrate to light via a pattern of an original while the original and the substrate are scanned. The apparatus includes a stage configured to hold the substrate and to move, a projection optical system configured to project the pattern of the original onto the substrate, a measurement unit configured to measure a positional deviation between superposition marks formed on the substrate, and a controller configured to control operation of projection of a slit shot pattern of an original onto plural areas of a substrate, with each area partially overlapping four of the plural areas adjacent to each other. The projection is performed by keeping the original stand still and moving the stage, to cause the measurement unit to perform measurement of a positional deviation between superposition marks in each of the overlapping areas formed through the projection, and to control movement of the stage based on the measurement.

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Japanese Office Action dated Sep. 2, 2005, issued in corresponding Japanese patent application No. 2003-292921.

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