Scanning exposure method and mask therefor

Details Scanning exposure method and mask therefor Scanning exposure method and mask therefor

1997-09-23

1999-11-30

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430397, 378 35, G03F 900

Patent

active

059940034

ABSTRACT:
A scanning exposure method includes steps of relatively scanning a mask and a wafer relative to exposure light of a slit beam, to transfer a pattern of the mask onto the wafer and applying a relative speed between the mask and the wafer in a scan direction, during the scan exposure in one shot area, wherein the relative speed is changed in accordance with thermal distortion of the mask pattern caused during the scan exposure.

REFERENCES:
patent: 5159483 (1992-10-01), Watanabe et al.
patent: 5308991 (1994-05-01), Kaplan
patent: 5526093 (1996-06-01), Takahashi
patent: 5593800 (1997-01-01), Fujioka et al.
patent: 5604779 (1997-02-01), Amemiya et al.
patent: 5822043 (1998-10-01), Ebinuma

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