Scanning exposure method and apparatus, and device...

Details Scanning exposure method and apparatus, and device... Scanning exposure method and apparatus, and device...

2005-02-15

2005-02-15

Turner, Samuel A. (Department: 2877)

Optics: measuring and testing

By light interference

For dimensional measurement

C356S508000

Reexamination Certificate

active

06856404

ABSTRACT:
A scan type exposure for transferring a pattern onto a substrate by scan exposure. The apparatus includes a stage for moving the substrate in a Y direction corresponding to a scan direction, and in an X direction intersecting the scan direction, an alignment scope for performing measurement for alignment of the substrate, at a position spaced, in the Y direction, from a position where the exposure of the substrate is to be carried out, an X measuring device for performing yaw measurement of said stage by use of an X reflection surface provided on said stage along the Y direction, a Y measuring device for performing yaw measurement of the stage by use of a Y reflection surface provided on the stage along the X direction, and a controller being operable to select yaw measurement information of the X measuring device for an alignment operation including the alignment measurement using the alignment scope, and being operable to select yaw measurement information of the Y measuring device for the scan exposure.

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patent: 6160619 (2000-12-01), Magome

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