Scanning exposure method and apparatus

Details Scanning exposure method and apparatus Scanning exposure method and apparatus

1995-12-01

1998-03-17

Duda, Kathleen

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

430311, 430397, 2504921, G03F 720

Patent

active

057284954

ABSTRACT:
A scanning exposure method is arranged to illuminate a mask with light pulses and to synchronously scan the mask and a photosensitive substrate so as to effect scanning exposure of a pattern image of the mask on the photosensitive substrate, and comprises detecting energy amounts of light pulses illuminating the mask during the scanning exposure, successively calculating an integrated amount of light of the last N pulses (N is an integer more than one) for every unit pulse number, based on the energy amounts thus detected and adjusting an exposure dose on the photosensitive substrate in accordance with a sequence of integrated amounts of light thus calculated.

REFERENCES:
patent: 4624551 (1986-11-01), Anzai et al.
patent: 4712910 (1987-12-01), Sakato
patent: 4970546 (1990-11-01), Suzuki et al.
patent: 5097291 (1992-03-01), Suzuki
patent: 5191374 (1993-03-01), Hazama et al.
patent: 5194893 (1993-03-01), Nishi

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