Scanning exposure method and an apparatus thereof

Photocopying – Projection printing and copying cameras – Step and repeat

Reexamination Certificate

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C355S067000

Reexamination Certificate

active

07106418

ABSTRACT:
A light source and a substrate are placed above and below a mask having a mask pattern thereon, respectively. Relative to the mask, the light source is moved in a first direction at a first speed, and the substrate is moved in a second direction at a second speed. The light of the light source transfers the mask pattern to a photoresist layer on the substrate, and forms a photoresist pattern thereof.

REFERENCES:
patent: 5437946 (1995-08-01), McCoy
patent: 6151099 (2000-11-01), Okamura et al.
patent: 6323937 (2001-11-01), Sano
patent: 6542223 (2003-04-01), Okazaki

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