Scanning exposure apparatus having a scanning device for scannin

Radiant energy – Photocells; circuits and apparatus – Optical or pre-photocell system

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

250548, 356400, H01J 314

Patent

active

055280277

ABSTRACT:
A scanning exposure apparatus according to the present invention comprises a reticle stage for continuously moving a reticle and a wafer stage for moving a wafer in synchronization with the movement of reticle. A light supply system emits light beams for detecting a relative positional relation between the reticle stage and the wafer stage toward the reticle. On this occasion the emitted light beams are scanned to follow the moving reticle stage, using for example a galvanometer scanner.

REFERENCES:
patent: 4822975 (1989-04-01), Toriqoe
patent: 5194893 (1993-03-01), Nishi

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Scanning exposure apparatus having a scanning device for scannin does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Scanning exposure apparatus having a scanning device for scannin, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Scanning exposure apparatus having a scanning device for scannin will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-224616

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.