Scanning exposure apparatus and method of manufacturing device

Details Scanning exposure apparatus and method of manufacturing device Scanning exposure apparatus and method of manufacturing device

2008-12-02

2010-11-02

Nguyen, Hung Henry (Department: 2882)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S069000

Reexamination Certificate

active

07826036

ABSTRACT:
A scanning exposure apparatus according to this invention has a light source which can change the central wavelength of exposure light to undergo pulsed oscillation, and scan-exposes a substrate with slit-like exposure light while periodically changing the central wavelength in synchronism with the pulsed oscillation of the exposure light. The scanning exposure apparatus includes a controller which controls the light source so that integrated values Sws and Swl obtained by integrating the intensity of the exposure light for each wavelength in the scanning direction in a short-wavelength range and long-wavelength range, respectively, assuming a target central wavelength as a reference satisfy:in-line-formulae description="In-line Formulae" end="lead"?|(Sws−Swl)/(Sws +Swl)|≦0.1.in-line-formulae description="In-line Formulae" end="tail"?

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patent: 2005-191503 (2005-07-01), None

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