Scanning exposure apparatus and method

Details Scanning exposure apparatus and method Scanning exposure apparatus and method

2005-09-20

2005-09-20

Kim, Peter B. (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S052000, C355S055000, C355S072000, C355S075000

Reexamination Certificate

active

06947122

ABSTRACT:
A scanning exposure apparatus includes an illumination optical system for illuminating a pattern on a mask using arc-shaped illumination light, a projection optical system for projecting the pattern on the mask illuminated by the illumination optical system onto a plate, a mask stage for scanning the mask, a plate stage for scanning the plate, the scanning exposure apparatus scanning the mask stage and plate stage synchronously relative to the projection optical system, a mask support mechanism for supporting a periphery of the mask, and a mask stage tilt mechanism for arranging the pattern in an area illuminated by the arc-shaped illumination light in an object-surface-side focal plane of the projection optical system, wherein the mask deforms due to its own weight from the peripheral supported.

REFERENCES:
patent: H001774 (1999-01-01), Miyachi
patent: 6522386 (2003-02-01), Nishi
patent: 6727980 (2004-04-01), Ota et al.
patent: 198 05 875 (1999-04-01), None
patent: 8-264431 (1996-11-01), None
Taiwanese Office Action dated Nov. 8, 2004, issued in corresponding Taiwanese patent application No. 92117473, with English translation.

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