Scanning exposure apparatus and device fabrication method in whi

Details Scanning exposure apparatus and device fabrication method in whi Scanning exposure apparatus and device fabrication method in whi

1997-10-30

2000-09-19

Turner, Samuel A.

Optics: measuring and testing

By dispersed light spectroscopy

Utilizing a spectrometer

356363, G01B 902

Patent

active

061220590

ABSTRACT:
The position of an original plate stage for moving an original plate and the position of a substrate stage for moving a substrate are measured by using an original plate laser interferometer and a substrate laser interferometer, respectively. While control is performed on the basis of the measured values, the pattern of the original plate is transferred onto the substrate by scan exposure by moving the original plate stage and the substrate stage in a scan direction. The measurements of the stage positions by the original plate laser interferometer and the substrate laser interferometer are performed by using light from a single laser head. If each of the original plate laser interferometer and the substrate laser interferometer includes a laser interferometer in the Y direction as the scan direction and a laser interferometer in the X direction perpendicular to the Y direction, the measurements by the original plate and substrate Y-direction laser interferometers are performed by using light from a single Y-direction laser head, and the measurements by the original plate and substrate X-direction laser interferometers are performed by using light from a single X-direction laser head.

REFERENCES:
patent: 4655594 (1987-04-01), Wittekoek et al.
patent: 5194893 (1993-03-01), Nishi
patent: 5281996 (1994-01-01), Bruning et al.

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