Scanner optimization for reduced across-chip performance...

Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing

Reexamination Certificate

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C700S098000, C438S040000

Reexamination Certificate

active

07460922

ABSTRACT:
The disclosed embodiments reduce across-chip performance variation through non-contact electrical metrology. According to a feature is a process control system that includes a component that measures transistor electrical performance in a product wafer. Also included in the system is a mapping component that converts the transistor performance into exposure dose values and a process tool that communicates the exposure dose value to a scanner. The exposure dose value is fed back for optimization of future chip exposures. The disclosed embodiments directly optimize transistor performance, thus controlling an important parameter in many integrated circuits.

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Maynard et al., Modeling and optimization of wafer Radial Yiels, 1999 , IEEE, pp. 71-75.

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