Scanner apparatus with twin substrate stage, semiconductor...

Details Scanner apparatus with twin substrate stage, semiconductor... Scanner apparatus with twin substrate stage, semiconductor...

2007-10-02

2007-10-02

Kim, Peter B. (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

53, 53, 53

Reexamination Certificate

active

11265117

ABSTRACT:
A scanner apparatus includes an exposure unit and an alignment unit, wherein the alignment unit includes an aligning/leveling apparatus for performing global aligning and leveling processes for a wafer in the alignment unit and an edge exposure apparatus, receiving light from a light source, for performing an edge exposure process for the wafer in the alignment unit.

REFERENCES:
patent: 5929976 (1999-07-01), Shibuya et al.
patent: 2003/0203295 (2003-10-01), Kim et al.
patent: 2004/0004700 (2004-01-01), Park et al.
patent: 2004/0130691 (2004-07-01), Boonman et al.
patent: 07-142373 (1995-06-01), None
patent: 1999-0031795 (1999-05-01), None
patent: 10-2000-0066105 (2000-11-01), None
patent: 10-2003-0002323 (2003-01-01), None

Affiliated with

Also associated with

Rating

Scanner apparatus with twin substrate stage, semiconductor... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Scanner apparatus with twin substrate stage, semiconductor..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Scanner apparatus with twin substrate stage, semiconductor... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3900862