Scan stage for semiconductor wafer pollutant measurement...

Details Scan stage for semiconductor wafer pollutant measurement... Scan stage for semiconductor wafer pollutant measurement...

2011-07-12

2011-07-12

Wilson, Lee D (Department: 3727)

Work holders

With fluid means

Vacuum-type holding means

C269S020000, C269S043000, C248S363000, C248S176200

Reexamination Certificate

active

07975996

ABSTRACT:
Provided is a scan stage for a semiconductor wafer pollutant measurement apparatus, which includes: a stage main body which comprises: a circular fixed housing; an adsorption plate which is rotatably installed in the inside of the fixed housing, at the center of which an adsorption path is formed, at the bottom of which a vacuum port is connected, and which is rotated by an external rotating force; and a step motor which is placed at the bottom of the fixed housing and connected with the adsorption plate; a base plate that is supported by pillars to form a lower space between the fixed housing of the stage main body and the base plate; a cylinder at the bottom of which a cylinder load is connected so that the base plate moves up and down; and support jigs that hold up a wafer in the outer side of the stage main body, in which three support jigs are disposed in proximity with the outer circumference of the stage main body.

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patent: 2004/0131783 (2004-07-01), Lee
patent: 2009/0250569 (2009-10-01), Kim et al.

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