Scan exposure apparatus and method, and device manufacturing...

Details Scan exposure apparatus and method, and device manufacturing... Scan exposure apparatus and method, and device manufacturing...

2007-04-03

2007-04-03

Stafira, Michael P. (Department: 2877)

Optics: measuring and testing

By alignment in lateral direction

C356S401000

Reexamination Certificate

active

11128219

ABSTRACT:
A scan exposure apparatus according to this invention determines a scan velocity and a focus measurement position from process conditions and the like and determines a threshold Δ of the focus measurement position on the basis of the scan velocity. The scan exposure apparatus executes focus measurement if a stage position falls within the range of the threshold Δ.

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Japanese Office Action dated Jul. 14, 2006, issued in corresponding Japanese patent application No. 2001-310051.

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